Materials Safety Data Sheets (MSDS)
IC fabrication utilizes many aggressive chemicals. It is the responsibility of the workers in the lab to have an understanding of what these chemicals can do and how to safely handle them.
Chemicals Used in HMNTL Cleanrooms (Partial List)
- Acetone - (CH3)2CO
- Ammonium Fluoride - NH4F
- Ammonium Hydroxide - NH4OH
- Buffered Oxide Etch - NH4-HF Aqueous Solution
- Chromium Etchant - CEP-200
- Hexamethyldisilazane - HMDS - ((CH3)3Si)2NH
- Hydrofluoric Acid - HF
- Hydrogen Peroxide - H2O2
- Hydrochloric Acid - HCl
- Isopropyl Alcohol (IPA) - (CH3)2 CHOH
- Methanol - CH3OH
- Methylene Chloride - CH2Cl2
- Nitric Acid - HNO3
- Phosphoric Acid - H3PO4
- Shipley 1813 photoresist
- Shipley MF-319 Developer
- Sulfuric Acid - H2SO4
- Xylene - C6H4(CH3)2
- DRS MSDSs