NPOS RTP 150

The NPOS RTP 150 rapid thermal process oven is a front‑loading system designed for 1 cm x 1 cm samples up to 150 mm wafers, delivering fast, repeatable high‑temperature cycles for applications such as RTA, RTO, RTN, dopant diffusion from spin‑on sources, crystallization, and contact alloying. It features upper and lower cross IR lamp arrays for excellent temperature uniformity, multi‑gas capability (N2 and O2), and rapid vacuum attainment to 1e-3 Torr to shorten process times. The platform supports quick ramp rates with external water‑cooled chamber, nitrogen wafer cooling, integrated data logging, and programmable recipes (up to 50 programs with 50 steps) for robust, production‑style control. These capabilities make the RTP 150 a versatile workhorse for silicon and compound semiconductor research and low‑volume prototyping